Yes, a message from the shameless commerce division no doubt, but there are a handful of excellent PLI patent related programs coming up in February and March that deserve a mention.  After all, how often can one attend a program, get CLE credits and meet Federal Circuit Judge Pauline Newman?  Not all that often to be sure, but Judge Newman will be attending and presenting at the Reexamination and Reissue program in New York City on February 11-12, 2010.  If you cannot make it to New York for the live program the event will be broadcast live via webcast.

So, without further ado, here is the PLI line-up through the end of March 2010.

Reissue and Reexamination Strategies and Tactics with Concurrent Litigation 2010
Feb. 11 – 12, 2010
PLI New York Center-New York, NY

With ever-escalating patent litigation costs, you cannot afford to miss this new PLI program. Reissue and Reexamination Strategies and Tactics with Concurrent Litigation brings together an expert faculty of judges, including Federal Circuit of Appeals Judge Pauline Newman, lawyers, and industry leaders who have earned national reputations in patent litigation and in post-grant proceedings at the USPTO. The program provides comprehensive coverage of reissue and reexamination strategies and tactics with concurrent litigation.

Other faculty include W. Todd Baker, Oblon, Spivak, McClelland, Maier & Neustadt, P.C., Stephen G. Kunin, Oblon, Spivak, McClelland, Maier & Neustadt, P.C., Leonard Richard Svensson, Birch, Stewart, Kolasch & Birch, LLP, and Gerald M. Murphy, Jr., Birch, Stewart, Kolasch & Birch, LLP, at PLI’s Reissue and Reexamination Strategies and Tactics with Concurrent Litigation.

Advanced Licensing Agreements 2010
Feb. 25 – 26, 2010
PLI California Center-San Francisco, CA

Companies have always used licensing to obtain technology and content outside their core areas or at lower cost, and/or to monetize their own offerings. In the current era of falling budgets and the need to replace lost revenue, this has become more important than ever. Whether licensing patents, copyrights, trade secrets or trademarks, the ability to structure, draft and negotiate complex license agreements is critical to a successful transaction. This program is designed to address some of the more complex as well as practical issues that arise in drafting and negotiating IP licenses. The program will feature updates on current legal developments, best practices, negotiating frequently contested issues, identifying and avoiding common pitfalls, keeping the relationship on track, litigation planning and avoidance, and ethics. The speakers will illustrate both outside counsel and in-house perspectives.

Patent Law Institute (4th Annual)
Mar. 1 – 2, 2010
PLI New York Center-New York, NY

Join the best at PLI’s 4th Annual Patent Law Institute, a unique professional development and networking opportunity. The Institute brings together hundreds of the best patent law practitioners, federal judges and U.S. Patent and Trademark Office officials as faculty and as participants.

Customize your participation to best meet your practice needs. The Institute has 6 plenary sessions of interest to all patent lawyers, including the very well received corporate counsel panel and judges panel, plus:

• Hear a USPTO Keynote Address
• Understand the practice impact of recent Supreme Court and Federal Circuit decisions
• Learn the latest on the pending Bilski case from a panel of experts
• Master the changes at the USPTO and how to manage client expectations

Also on the docket for March 2010 are:

Patent Litigation for the Non-Specialist 2010
Mar. 9, 2010
PLI California Center-San Francisco, CA

Reissue and Reexamination Strategies and Tactics with Concurrent Litigation 2010
Mar. 11 – 12, 2010
University of Chicago – Gleacher Center-Chicago, IL

Patent Bar Review 2010
Mar. 17 – 21, 2010
The John Marshall Law School-Chicago , IL

Patent Law Institute (4th Annual)
Mar. 22 – 23, 2010
PLI California Center-San Francisco, CA

Advanced Licensing Agreements 2010
Mar. 25 – 26, 2010
PLI New York Center-New York, NY

Announcing the Loyola Patent Law Interview Program – July 29-30

The 2010 Patent Law Interview program will be held on Thursday, July 29 and Friday, July 30 at the Embassy Suites Chicago, downtown Chicago. Eligible students are JD students graduating in May 2011, May 2012, December 2010, December 2011, and students in LLM programs with anticipated graduation dates in 2011 and 2012. Students do not need to be patent bar eligible to register, however, many employers prefer patent bar eligible students. Student registration will begin online on February 15 through March 8. No late registrations will be accepted. There will be an online $35 registration fee to complete registration. Cymie Wehr is the program liaison. Our school is listed as “University of Iowa” which you will  need for registration. The student registration link is at http://www.luc.edu/law/career/Patent_Program_-_Stu.html.